APPARATUS AND METHOD FOR ALIGNMENT USING MULTIPLE WAVELENGTHS OF LIGHT

摘要

A method and system are disclosed for aligning a lithography template (120) having a pattern with a sunstrate (130) in preparation for transferring the pattern to a surface of the substrate (130). The system includes an optical imaging system (100) adapted to image a first alignbment structure formed on a top surface of the template (120) using light of a first wavelength and a second alignment structure formed on a top surface of the substrate (130) using light of a second wavelength.