发明名称 |
PLASTIC MOLDED ARTICLE COMPRISING VAPOR DEPOSITION FILM FORMED BY PLASMA CVD METHOD |
摘要 |
<p>Disclosed is a plastic molded article wherein a vapor deposition film is formed on the surface of a plastic substrate by a plasma CVD method. The vapor deposition film is composed of an organosilicon vapor deposition layer formed on the front surface of a plastic substrate (1) and containing no oxygen, and a silicon oxide vapor deposition layer formed on the organosilicon vapor deposition layer. This plastic molded article has good gas barrier property, while being effectively prevented from generation of odor during film formation. In addition, the plastic molded article has excellent flavor-retaining property.</p> |
申请公布号 |
WO2008013314(A1) |
申请公布日期 |
2008.01.31 |
申请号 |
WO2007JP65112 |
申请日期 |
2007.07.26 |
申请人 |
TOYO SEIKAN KAISHA, LTD.;YAMADA, KOUJI;IEKI, TOSHIHIDE;AIHARA, TAKESHI |
发明人 |
YAMADA, KOUJI;IEKI, TOSHIHIDE;AIHARA, TAKESHI |
分类号 |
B32B9/00;B65D23/02;B65D25/14;C23C16/42 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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