发明名称 PLASTIC MOLDED ARTICLE COMPRISING VAPOR DEPOSITION FILM FORMED BY PLASMA CVD METHOD
摘要 <p>Disclosed is a plastic molded article wherein a vapor deposition film is formed on the surface of a plastic substrate by a plasma CVD method. The vapor deposition film is composed of an organosilicon vapor deposition layer formed on the front surface of a plastic substrate (1) and containing no oxygen, and a silicon oxide vapor deposition layer formed on the organosilicon vapor deposition layer. This plastic molded article has good gas barrier property, while being effectively prevented from generation of odor during film formation. In addition, the plastic molded article has excellent flavor-retaining property.</p>
申请公布号 WO2008013314(A1) 申请公布日期 2008.01.31
申请号 WO2007JP65112 申请日期 2007.07.26
申请人 TOYO SEIKAN KAISHA, LTD.;YAMADA, KOUJI;IEKI, TOSHIHIDE;AIHARA, TAKESHI 发明人 YAMADA, KOUJI;IEKI, TOSHIHIDE;AIHARA, TAKESHI
分类号 B32B9/00;B65D23/02;B65D25/14;C23C16/42 主分类号 B32B9/00
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