发明名称 |
SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a capacitor of a stack DRAM excellent in electrical characteristics and reliability. SOLUTION: There is provided a semiconductor device having: a lower electrode connected to one of a source or a drain of an MIS transistor; and a capacitor for charge storage composed of a capacitor insulating film formed on an upper face and a side face of the lower electrode and an upper electrode formed on the capacitor insulating film, wherein the side face near a bottom part of the lower electrode is recessed and this recessed part is brought into contact with the insulating film different from the capacitor insulating film. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008022035(A) |
申请公布日期 |
2008.01.31 |
申请号 |
JP20070258119 |
申请日期 |
2007.10.01 |
申请人 |
TOSHIBA CORP |
发明人 |
HIEDA KATSUHIKO;YAMAZAKI SOICHI;EGUCHI KAZUHIRO;SUGURO KYOICHI |
分类号 |
H01L21/8242;H01L21/3205;H01L23/52;H01L27/108 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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