发明名称 SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a capacitor of a stack DRAM excellent in electrical characteristics and reliability. SOLUTION: There is provided a semiconductor device having: a lower electrode connected to one of a source or a drain of an MIS transistor; and a capacitor for charge storage composed of a capacitor insulating film formed on an upper face and a side face of the lower electrode and an upper electrode formed on the capacitor insulating film, wherein the side face near a bottom part of the lower electrode is recessed and this recessed part is brought into contact with the insulating film different from the capacitor insulating film. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008022035(A) 申请公布日期 2008.01.31
申请号 JP20070258119 申请日期 2007.10.01
申请人 TOSHIBA CORP 发明人 HIEDA KATSUHIKO;YAMAZAKI SOICHI;EGUCHI KAZUHIRO;SUGURO KYOICHI
分类号 H01L21/8242;H01L21/3205;H01L23/52;H01L27/108 主分类号 H01L21/8242
代理机构 代理人
主权项
地址