发明名称 NONVOLATILE MEMORY DEVICE, AND METHOD OF MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile memory device the characteristics of which have been improved. SOLUTION: The nonvolatile memory device includes a semiconductor substrate including an active region and first and second memory cell strings on the active region. The first memory cell string including a plurality of first word lines that cross the active region between a first ground selection line and a first string selection line and a first arrangement interval is provided between adjoining lines in the plurality of the first word lines. The second memory cell string includes a plurality of second word lines that cross the active region between a second ground selection line and a second string selection line and the same first arrangement interval is provided between adjoining lines in the plurality of the second word lines. The first ground selection line is between the second ground selection line and the plurality of the first word lines and the second ground selection line is between the first ground selection line and the plurality of the second word lines. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008022009(A) 申请公布日期 2008.01.31
申请号 JP20070182659 申请日期 2007.07.11
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 SEL JONG-SUN;CHOI JUNG-DAL;PARK YOUNG-WOO;PARK JIN-TAEK
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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