| 摘要 |
An embodiment of a method for forming a nano-imprint lithography template having very high feature counts includes exposing a sub-template using electron beam lithography, the sub-template including a fraction of the template, transferring a first pattern from the sub-template to the template using nano-imprinting lithography, repositioning the sub-template, and transferring a second pattern from the sub-template to the template using nano-imprinting lithography, wherein the template includes the first pattern and the second pattern.
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