发明名称 |
MICROWAVE PLASMA SOURCE AND PLASMA PROCESSING APPARATUS |
摘要 |
<p>A microwave plasma source (2) is provided with a microwave outputting section (30) which outputs microwaves in a plurally divided state, and a plurality of antenna modules (41) for guiding the plurally divided microwaves into a chamber. Each antenna module (41) is provided with an amplifier section (42) having an amplifier (47) for amplifying the microwaves, an antenna section (44) having an antenna (51) for radiating the amplified microwaves into the chamber, and a tuner (43) for adjusting impedance in a microwave transmission path. The tuner (43) is integrally arranged with the antenna section (44) to be close to the amplifier (47).</p> |
申请公布号 |
WO2008013112(A1) |
申请公布日期 |
2008.01.31 |
申请号 |
WO2007JP64345 |
申请日期 |
2007.07.20 |
申请人 |
TOKYO ELECTRON LIMITED;KASAI, SHIGERU |
发明人 |
KASAI, SHIGERU |
分类号 |
H01L21/3065;C23C16/511;H01L21/205;H05H1/46 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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