Verfahren zur Herstellung einer Photolithographie-Belichtungsmaske

摘要

A method for fabricating a mask comprising the steps of: (a) forming a light-shielding film on an entire surface of a substrate including an actual pattern region (R) and an unoccupied region (S) other than the actual pattern region; (b) patterning the light-shielding film (2a) on the actual pattern region while leaving the light-shielding (2b) film on the unoccupied region; and (c) removing the light-shielding film on the unoccupied region while leaving the patterned light-shielding film on the actual pattern region.