| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photolithography machine capable of inhibiting leakage of a liquid and keeping exposure accuracy and measurement accuracy. <P>SOLUTION: The photolithography machine has a liquid contact surface placed to surround a light path space of exposed light and to face a substrate, and includes an immersion space forming member capable of forming an immersion space between the surface of the substrate and itself. Liquid collecting regions and non-liquid collecting regions are alternately placed around the light path space of the exposed light on the liquid contact surface of the immersion space forming member. The non-liquid collecting regions are provided on both sides of the light path space of the exposed light in a first direction, and on both sides of the light path space of the exposed light in a second direction orthogonal to the first direction. <P>COPYRIGHT: (C)2008,JPO&INPIT |
