发明名称 SUBSTRATE FOR ELECTRO-OPTICAL DEVICE, ELECTRO-OPTICAL DEVICE, ELECTRONIC APPARATUS, AND METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTRO-OPTICAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate for an electro-optical device that can reduce contact resistance between wiring and a source-drain region without the need of a new photomask, and to provide an electro-optical device, an electronic apparatus, and a method for manufacturing a substrate for an electro-optical device. SOLUTION: The liquid crystal display device 100a has a TFT substrate 10a and a counter substrate 20a. TFT elements 30 and data lines 6a are formed on the TFT substrate 10a. A titanium silicide layer is formed on a portion in contact with the data line 6a of a high concentration source region 1d of the TFT element 30. Also a titanium silicide layer is formed on a portion in contact with a relay layer 6a1 for a shield layer of a capacitor electrode 300, and on a portion in contact with a second relay electrode 6a2 of a relay electrode 719 . Thereby, contact resistance can be decreased. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008020572(A) 申请公布日期 2008.01.31
申请号 JP20060191089 申请日期 2006.07.12
申请人 SEIKO EPSON CORP 发明人 MORIWAKI MINORU
分类号 G02F1/1368;G09F9/00;G09F9/30;H01L29/786 主分类号 G02F1/1368
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