| 发明名称 |
STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF |
| 摘要 |
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
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| 申请公布号 |
US2008023858(A1) |
申请公布日期 |
2008.01.31 |
| 申请号 |
US20070867831 |
申请日期 |
2007.10.05 |
| 申请人 |
KOBAYASHI HIRONORI;YAMAMOTO MANABU;AOKI DAIGO;KAMIYAMA HIRONORI;HIKOSAKA SHINICHI;KASHIWABARA MITSUHIRO |
发明人 |
KOBAYASHI HIRONORI;YAMAMOTO MANABU;AOKI DAIGO;KAMIYAMA HIRONORI;HIKOSAKA SHINICHI;KASHIWABARA MITSUHIRO |
| 分类号 |
B29D11/00;B41C1/10;B41N1/00;G03F7/00;G03F7/004;G03F7/075 |
主分类号 |
B29D11/00 |
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