发明名称 |
Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.
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申请公布号 |
US2008024748(A1) |
申请公布日期 |
2008.01.31 |
申请号 |
US20060494794 |
申请日期 |
2006.07.28 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ZAAL KOEN JACOBUS JOHANNES MARIA;OTTENS JOOST JEROEN;STOELDRAIJER JUDOCUS MARIE DOMINICUS;DE KORT ANTONIUS JOHANNES;VAN DE MAST FRANCISCUS;DE JONG MARTEIJN |
分类号 |
G03B27/58 |
主分类号 |
G03B27/58 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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