发明名称 |
METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES |
摘要 |
Chloropolysilanes are utilized in methods and systems for selectively depositing thin films useful for the fabrication of various devices such as microelectronic and/or microelectromechanical systems (MEMS).
|
申请公布号 |
US2008026149(A1) |
申请公布日期 |
2008.01.31 |
申请号 |
US20070753370 |
申请日期 |
2007.05.24 |
申请人 |
ASM AMERICA, INC. |
发明人 |
TOMASINI PIERRE;ARENA CHANTAL;BAUER MATTHIAS;CODY NYLES;BERTRAM RONALD;WEN JIANQING;STEPHENS MATTHEW D. |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|