发明名称 METHODS AND DEVICES FOR FORMING NANOSTRUCTURE MONOLAYERS AND DEVICES INCLUDING SUCH MONOLAYERS
摘要 Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices). Methods for protecting nanostructures from fusion during high temperature processing are also provided.
申请公布号 WO2008013959(A2) 申请公布日期 2008.01.31
申请号 WO2007US16948 申请日期 2007.07.27
申请人 NANOSYS, INC.;NALLABOLU, MADHURI, L.;LIU, CHAO;DUAN, XIANGFENG;CHEN, JIAN;PARCE, J., WALLACE;CRUDEN, KAREN, CHU;RANGANATHAN, SRIKANTH 发明人 NALLABOLU, MADHURI, L.;LIU, CHAO;DUAN, XIANGFENG;CHEN, JIAN;PARCE, J., WALLACE;CRUDEN, KAREN, CHU;RANGANATHAN, SRIKANTH
分类号 H01L21/31;H01L21/28;H01L21/82;H01L27/10;H01L29/739 主分类号 H01L21/31
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