| 摘要 |
The method of producing a thin film magnetic head is capable of flattening a surface of a hard bias film without badly influencing a read-element. The method comprises the steps of: forming a magnetoresistance effect film on a wafer substrate; forming a resist layer, at a position corresponding to a read-element of the thin film magnetic head, on the magnetoresistance effect film; forming the read-element by removing a part of the magnetoresistance effect film which is exposed from the resist layer; forming an insulating film so as to coat side faces of the read-element; forming a hard bias film on the insulating film by sputtering; and etching a surface of the hard bias film by ion beam etching so as to flatten the surface thereof.
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