| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection apparatus capable of improving inspection efficiency. SOLUTION: The inspection apparatus comprises a rotation supporting unit (rotation table) 20 for supporting and rotating an object to be inspected (semiconductor wafer) 10, eccentric state detection units 32, 33 for detecting the eccentric state between the center of the object to be inspected and center of the rotation supporting unit, a defect inspection unit 40 for inspecting defects in an peripheral area 10a of the object to be inspected, and an adjustment unit (positioning mechanism 30) for adjusting relative position between the peripheral area of the object to be inspected and defect detection unit based on the eccentric state. COPYRIGHT: (C)2008,JPO&INPIT
|
