| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method of an exhausting portion (the vicinity of the pressure control valve of the valve of a vapor-phase growth apparatus), in the vapor-phase growth apparatus wherein the automatic control of its pressure control valve can be performed by the pressure of its chamber. SOLUTION: In the vapor-phase growth apparatus, the control of the cleaning of reactive byproducts 110 stuck to the vicinity of the pressure control valve of a valve 105 is so determined by the angle of the pressure control valve which is caused by the change of the quantity of the reactive byproducts 110 as to complete the cleaning, when the angle of the pressure control valve becomes nearly equal to the angle of it having before a film formation. COPYRIGHT: (C)2008,JPO&INPIT
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