发明名称 DEVICE/METHOD FOR TREATING SUBSTRATE AND SUBSTRATE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To perform a replacement of a chemical solution with a cleaning liquid for an entire substrate in a short time and thereby, eliminate irregularities in a substrate treatment process. SOLUTION: A roller 10 moves the substrate 1 in a substrate transfer direction shown by an arrow A. In a chemical solution treatment chamber 20, a chemical solution nozzle 21 supplies the chemical solution to the surface of the substrate 1. The surface of the substrate 1 is treated with the chemical solution supplied to the surface of the substrate 1. In a cleaning chamber 30, an aquaknife 31 supplies the cleaning liquid to the surface of the substrate 1, while moving in a reverse direction (shown by an arrow B) to the substrate transfer direction. The chemical solution is replaced with the cleaning liquid by the washing of the chemical solution from the surface of the substrate 1 by the cleaning liquid supplied to the surface of the substrate 1. As the cleaning liquid supplied to the substrate 1 is transferred in the reverse direction to the substrate transfer direction while moving the substrate 1, the time required for the supply of the cleaning liquid to the entire surface of the substrate 1, is shortened. Consequently, the replacement of the chemical solution with the cleaning liquid for the entire substrate 1, takes place in a short time. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008018324(A) 申请公布日期 2008.01.31
申请号 JP20060191675 申请日期 2006.07.12
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MORIGUCHI YOSHIHIRO
分类号 B08B3/02;C23G3/00;G02F1/13;H01L21/027 主分类号 B08B3/02
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