发明名称 SUBSTRATE STAGE AND HEAT TREATMENT APPARATUS
摘要 A stage body has a holding surface for placing a substrate thereon. A predetermined embossed configuration is formed by embossing on the holding surface, and thereafter an alumina film in an amorphous state is formed by an anodic oxidation process on the holding surface. The alumina film having an amorphous structure is dense and strong to provide high wear resistance and to substantially prevent separation electrification. This provides a substrate stage having high wear resistance and capable of preventing separation electrification.
申请公布号 US2008024742(A1) 申请公布日期 2008.01.31
申请号 US20070779571 申请日期 2007.07.18
申请人 OHMI TADAHIRO;MURAOKA YUSUKE;MIYAJI YASUYOSHI;NAGASHIMA YASUSHI 发明人 OHMI TADAHIRO;MURAOKA YUSUKE;MIYAJI YASUYOSHI;NAGASHIMA YASUSHI
分类号 G03B27/58;G03B27/52 主分类号 G03B27/58
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