发明名称 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RESIN TRANSFER FILM, MANUFACTURING METHOD OF PHOTO SPACER, SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 A photosensitive composition is provided to ensure high deformation recovery properties and to remove display stains in a liquid crystal display device. A photosensitive composition comprises at least (A) a resin containing a group having a branched and/or alicyclic structure in the side chain, a group having an acid group in the side chain, and a group having an ethylenically unsaturated group in the side chain, (B) a polymerizable compound, and (C) a photopolymerization initiator. The resin(A) has a glass transition temperature(Tg) of 40-180 °C and a weight average molecular weight of 10,000-100,000. A mass ratio((B)/(A)) of the polymerizable compound(B) to the resin(A) is 0.5-2.
申请公布号 KR20080010354(A) 申请公布日期 2008.01.30
申请号 KR20070075221 申请日期 2007.07.26
申请人 FUJI FILM CORPORATION 发明人 YOSHINARI SHINICHI;GOTOH HIDENORI;FUJIMAKI KAZUHIRO;YOSHIMURA KOUSAKU;MOCHIZUKI KYOHEI
分类号 G03F7/027;C09K3/10 主分类号 G03F7/027
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