| 摘要 |
<p>A lithographic apparatus includes an illumination system that conditions a radiation beam, a patterning support holding a patterning device that patterns the radiation beam, a substrate support to hold a substrate, a projection system to project the patterned radiation beam onto the substrate, an additional support, and a flexible line assembly to transfer at least one of a current, a signal and a fluid. A first part (46) of the line assembly extends between a base (38) and the additional support (32), and a second part (48) extends between the additional support and the patterning support or the substrate support (30). A first motor assembly generates a force in at least one direction, and is coupled to the one of the patterning support and the substrate support. A second motor assembly generates a force in the at least one direction, and is coupled to the addition support. The first motor assembly includes a planar motor.</p> |
