| 摘要 |
To provide a developer composition for resists, capable of improving dimensional controllability of a resist pattern. The developer composition for resists comprises an organic quaternary ammonium base as a main component, said developer composition further comprising an anionic surfactant represented by the following general formula (I), and SO<SUB>4</SUB><SUP>2-</SUP>, the content of S<SUB>4</SUB><SUP>2-</SUP> being from 0.01 to 1% by mass. In the formula, at least one of R<SUB>1 </SUB>and R<SUB>2 </SUB>represents an alkyl or alkoxy group having 5 to 18 carbon atoms and the other one represents a hydrogen atom, or an alkyl or alkoxy group having 5 to 18 carbon atoms, and at least one of R<SUB>3</SUB>, R<SUB>4 </SUB>and R<SUB>5 </SUB>represents an ammonium sulfonate group or a sulfonic acid-substituted ammonium group and the others represent a hydrogen atom, an ammonium sulfonate group or a sulfonic acid-substituted ammonium group. |
