| 摘要 |
A substrate processing apparatus and a substrate processing method are provided to alleviate a difference in medicine liquid component concentration in the processing liquid in a processing bath. A substrate processing apparatus(10a) principally includes a processing bath for storing a processing liquid therein and a lifter(5) serving as a mechanism for transporting substrates(W). The processing bath is a container capable of storing the processing liquid therein, and performs a process on major surfaces of the respective substrates by immersing the substrates in the processing liquid. Medicine liquid and deionized water is used as the processing liquid stored in the processing bath. The medicine liquid and the deionized water is replaced with each other in an alternating manner. An etching process is performed when the medicine liquid is used as the processing liquid, and a rinsing process is performed when the deionized water is used as the processing liquid.
|
