发明名称 LIQUID TREATMENT SYSTEM
摘要 A liquid treatment system is provided to save a space through miniaturization and perform a uniform treatment by suppressing the unevenness of a pipe. A liquid treatment system includes a liquid treating part(21b), a treatment liquid storing part(21h), and a pipe unit(21f). The liquid treating unit includes a plurality of liquid treating units(22) for treating liquid by supplying the liquid to a substrate. The treatment liquid storing part stores the treatment liquid supplied to the plurality of liquid treating units of the liquid treating part. The pipe unit is provided with a supply pipe for introducing the treatment liquid to the plurality of liquid treating units from the treatment liquid storing part. The treatment liquid storing part, the pipe unit, and the liquid treating part are laminated in a common case sequentially from the bottom. The supply pipe of the pipe unit is provided with a horizontal pipe portion extending horizontally in the arrangement direction of the plurality of liquid treating units. The treatment liquid is introduced into the liquid treating units from the horizontal pipe portion.
申请公布号 KR20080010325(A) 申请公布日期 2008.01.30
申请号 KR20070074479 申请日期 2007.07.25
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUMOTO KAZUHISA;KANEKO SATOSHI;AKIMOTO MASAMI;TOSHIMA TAKAYUKI;ITO NORIHIRO
分类号 H01L21/304;H01L21/08 主分类号 H01L21/304
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