发明名称 |
POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION |
摘要 |
<p>The present invention is a positive resist composition and a resist pattern forming method including a resin component (A) which has a polymer compound (A1) having a structural units (a1) including an acetal type acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group, and an acid generator component (B) having an onium salt-based acid generator (B1) having a cation portion represented by a general formula (b-1) shown below
[wherein, R 11 represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; R 12 to R 13 each represents, independently, an aryl group or the alkyl group that may have substituent group; n' represents either 0 or an integer from 1 to 3].</p> |
申请公布号 |
EP1882981(A1) |
申请公布日期 |
2008.01.30 |
申请号 |
EP20060732052 |
申请日期 |
2006.04.18 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KINOSHITA, YOHEI;OHKUBO, WAKI;NAKAGAWA, YUSUKE;HIDESAKA, SHINICHI;IRIE, MAKIKO |
分类号 |
G03F7/039;C08F220/28;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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