| 摘要 |
A substrate processing apparatus having a buffer insulator in the gap between different potential surfaces is provided to highly reduce the contamination in a chamber by preventing the unnecessary deposition of films in a buffer space. A substrate processing apparatus includes a chamber surrounding a reaction space, and a power supply device insulated from the chamber. The substrate processing apparatus further includes a gap, insulators(20), and buffer insulators(40). The gap is formed between a first potential surface and a second potential surface in the chamber. The insulators are inserted inside the gap to insulate, and adjacent end portions thereof are separated from each other to form buffer spaces therebetween. The buffer insulators are inserted into the buffer spaces.
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