| 摘要 |
<p>A damper having chemical resistance, capable of being used in a high-pressure environment, and capable of removing pressure pulsation. The damper has a fluid chamber (23) into which and from which fluid flows; a diaphragm (71) for forming at least one surface of the fluid chamber (23); a partition chamber (53) adjacent the fluid chamber (23) in a liquid-tight manner with the diaphragm (71) in between. The diaphragm (71) is composed of a first film (73) having chemical resistance and a second film (75) having pressure resistance.</p> |
