发明名称 PHOTOSENSITIVE COMPOSITION AND CURED PRODUCT THEREOF
摘要 <p>There is provided a photosensitive composition excellent in photo-curability which comprises an epoxy compound having two or more epoxy groups, a polynuclear phenol compound having a specific structure and an energy beam-sensitive cationic polymerization initiator, and optionally a predetermined percentage of a hydroxyl group-containing compound having one or more hydroxyl groups and one or more of at least one of a vinyl ether group and an oxetanyl group in a molecule, and a cured product of the same whose film is excellent in adhesion to various substrates, water resistance and flexibility.</p>
申请公布号 KR100799146(B1) 申请公布日期 2008.01.29
申请号 KR20067003402 申请日期 2006.02.20
申请人 发明人
分类号 G03F7/004;C08G59/40;C08G59/62;C09D5/00;C09D7/12;C09D11/00;C09D11/322;C09D11/328;C09D11/38;C09D161/06;C09D163/00;C09J11/06;C09J163/00 主分类号 G03F7/004
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