| 摘要 |
<p>A substrate treating method and a substrate treating apparatus are provided to improve efficiency by effectively preventing the drying of a substrate surface during the transfer from a first treatment unit to a second treatment unit. A substrate treating method includes a first treatment of supplying a treatment liquid to a horizontal substrate in a first treatment unit, and a second treatment of supplying the treatment liquid to an inclined substrate in a second treatment unit. The substrate treating method includes the steps of: converting the position of the substrate from the horizontal position to the temporary inclined position with a smaller inclination than the predetermined main inclined position; transferring the substrate to the second treatment unit from the first treatment unit; converting the position of the substrate to the main inclined position; and performing the second treatment on the substrate of the main inclined position. A substrate processing device for implementing the method includes a loader(2), a treatment processing unit(30), a cleaning processing unit(4), a drying unit(5) and a unloader(6).</p> |
