SEMICONDUCTOR APPARATUS HAVING MONITERING SYSTEM OF TEMPERATURE AND HUMIDITY IN VACUUM CHAMBER AND METHODE OF ANALYSIS THE TEMPERATURE AND THE HUMIDITY

摘要

A semiconductor apparatus having a monitoring system of temperature and humidity in a vacuum chamber and a method of analyzing temperature and humidity are provided to prevent the abnormal growth of a wafer oxide film and the condensation of a wafer by monitoring the state of temperature and humidity in a loadlock chamber through a temperature sensor and a humidity sensor. A semiconductor apparatus having a monitoring system of temperature and humidity in a vacuum chamber(100) includes the vacuum chamber, a pumping line(130), an upper temperature sensor(T1) and an upper humidity sensor(H1), a lower temperature sensor(T2) and a lower humidity sensor(H2), and a monitoring system. The pumping line is attached in the vacuum chamber. The upper temperature sensor and the upper humidity sensor are arranged at the upper part inside the vacuum chamber. The lower temperature sensor and the lower humidity sensor are arranged at the lower part inside the vacuum chamber. The monitoring system is arranged outside the vacuum chamber, and receives the data of the upper and lower temperature sensors and the upper and lower humidity sensors in real time.