发明名称 Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope
摘要 In order to provide a scanning probe microscope capable of measuring with high throughput distribution information relating to local characteristics of a sample concurrently with accurate three-dimensional shape information of the sample without damaging the sample, the speed of approach to each measurement location is increased by controlling the approach of the sample and probe by the provision of a high-sensitivity proximity sensor of the optical type. Also, additional information relating to the distribution of material quality on the sample can be obtained without lowering the scanning speed by: applying a voltage to the probe, or measuring the response on vibrating the probe, or detecting the local optical intensity of the sample surface concurrently with obtaining sample height data and concurrently with the contact period with the sample, whilst ensuring that the probe is not dragged over the sample, by bringing the probe into contact with the sample intermittently.
申请公布号 US7323684(B2) 申请公布日期 2008.01.29
申请号 US20060439618 申请日期 2006.05.23
申请人 HITACHI, LTD. 发明人 WATANABE MASAHIRO;NAKATA TOSHIHIKO
分类号 G01B21/16;G01B5/28;G01B21/30;G01Q10/00;G01Q10/02;G01Q10/04;G01Q10/06;G01Q20/00;G01Q20/02;G01Q30/02;G01Q30/20;G01Q60/24;G01Q60/32;H01L21/66 主分类号 G01B21/16
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