METHOD FOR IN-SITU, POST DEPOSITION SURFACE PASSIVATION OF A CHEMICAL VAPOR DEPOSITED FILM,申请号KR20017005460-传众专利搜索

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发明名称	METHOD FOR IN-SITU, POST DEPOSITION SURFACE PASSIVATION OF A CHEMICAL VAPOR DEPOSITED FILM
摘要
申请公布号	KR100798552(B1)	申请公布日期	2008.01.28
申请号	KR20017005460	申请日期	2001.04.30
申请人		发明人
分类号	H01L21/205;(IPC1-7):H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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