FLAW INSPECTION SYSTEM AND FLAW INSPECTION METHOD

摘要

PROBLEM TO BE SOLVED: To extract a target flaw with high sensitivity.

SOLUTION: An image processing means 21 is constituted so as to form an image wherein the image acquired in a flaw inspection device 1 and plan data or layout data acquired from the inspection of a reticle are superposed one upon another. A user indicates a flaw inspection region and detection sensitivity on the basis of the superposed image using an inspection condition setting device. The flaw is inspected on the basis of an inspection condition by the flaw inspection device 1. Since the flaw inspection region including several kinds of patterns is not indicated as is conventional but detection sensitivity is changed at each pattern itself, the detection quantity of a false flaw can be reduced and the detection sensitivity of the target flaw can be enhanced.

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