| 摘要 |
PROBLEM TO BE SOLVED: To inhibit particle generation and prevent wafer contamination caused by particles in a vertical wafer holder that holds wafers to be processed in a vertical furnace. SOLUTION: An open structure is adopted for the vertical wafer holder 20 as a whole, wherein the wafer holder holds wafers 12 and is charged in a vertical furnace. By loading thermally insulating plates 14 at a necessary range of a lower portion of the wafer holder, a gas charge subsequent to the wafer processing is made to be completely performed, and accordingly, residues of reaction gases that cause the particle generation are prevented. COPYRIGHT: (C)2008,JPO&INPIT |
