| 摘要 |
<P>PROBLEM TO BE SOLVED: To curb the influence of polymerization inhibition by oxygen in the air having action to deactivate radicals in a photosensitive layer generated by exposure, to improve discrimination of water resistance between an unexposed area and an exposed area with high sensitivity, and to achieve excellent printing durability, in a method for preparation of a lithographic printing plate in which post exposure is performed after exposure/development processing. <P>SOLUTION: A lithographic printing plate precursor having a photosensitive layer containing (A) a sensitizing dye, (B) a radical polymerization initiator, (C) a radical polymerizable compound and (D) a binder polymer and a protective layer in this order on a hydrophilic support is exposed to laser radiation, development processing is conducted to remove the protective layer and an unexposed area of the photosensitive layer, the exposed area of the photosensitive layer remaining on a surface of a lithographic printing plate is covered with a layer of liquid, and overall exposure of the lithographic printing plate to light having a wavelength capable of causing radical polymerization is performed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
