| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive paste capable of pattern formation by a single exposure even in the case of a thick film and capable of producing barrier ribs which ensure small dimensional variation before and after baking, have excellent adhesion to a substrate and are free of residues in an unexposed portion. <P>SOLUTION: [1] The photosensitive paste comprises (A) inorganic particles, (B) an alkali-soluble resin, (C) a crosslinking agent, (D) an acid generator and (E) an organic solvent, wherein the component (E) contains an organic solvent (E-A) having a boiling point under 1 atm of 100 to <195°C as an essential component. [2] In the photosensitive paste, the component (E) contains an organic solvent (E-A) having a boiling point under 1 atm of <195°C and an organic solvent (E-B) having a boiling point under 1 atm of ≥195°C as essential components. There are also provided [3] barrier ribs for a plasma display obtained using the photosensitive paste and [4] a member for a plasma display equipped with the barrier ribs. <P>COPYRIGHT: (C)2008,JPO&INPIT |
