发明名称 NON-VOLATILE MEMORY CELL HAVING A SILICON-OXIDE-NITRIDE-OXIDE-SILICON GATE STRUCTURE AND FABRICATION METHOD OF SUCH CELL
摘要 A non-volatile memory cell able to be written in a first direction and read in a second direction is described. The memory cell includes one or two charge trapping regions located near either the source or the drain, or both the source and the drain. During a programming operation, electrons can be injected into the charge trapping region by hot electron injection. During an erasing operation, holes can be injected into the charge trapping region. Embodiments of the invention include a charge trapping region that is overlapped by the control gate only to an extent where the electrons that were injected during a programming operation can be erased later by injecting holes in the charge trapping region.
申请公布号 US2008020527(A1) 申请公布日期 2008.01.24
申请号 US20070833132 申请日期 2007.08.02
申请人 发明人 KANG SUNG-TAEG;KIM SEUNG-GYUN;HAN JUNG-WOOK;YOO HYUN-KHE
分类号 H01L21/336 主分类号 H01L21/336
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