AN OPTICAL INSPECTING METHOD OF A PLASMA PROCESSING DEGREE OF A SiON FILM

摘要

An optical inspecting method of a plasma processing degree of a SiON film includes: firstly, depositing the SiON film on a semiconductor wafer by using a chemical vapor deposition,and then performing the plasma processing on the SiON film, and finally performing the optical inspectin to the plasma processing degree of the SiON film using optical inspecting method. The plasma processing degree thereof is judged based on the change of the SiON film's refractivity or reflectivity.