发明名称 |
DIFFUSER PLATE WITH SLIT VALVE COMPENSATION |
摘要 |
The present invention generally comprises a diffuser plate for a PECVD chamber. The diffuser plate comprises a plurality of hollow cathode cavities. The edge of the diffuser plate that will reside closest to a slit valve within a processing chamber may have the shape and/or size of the hollow cathode cavities adjusted to compensate for the proximity to the slit valve. By adjusting the shape and/or size of the hollow cathode cavities closest to the slit valve, the diffuser plate may permit a uniform plasma distribution across the processing chamber and thus, a uniform film thickness upon a substrate during a PECVD process.
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申请公布号 |
US2008020146(A1) |
申请公布日期 |
2008.01.24 |
申请号 |
US20070780478 |
申请日期 |
2007.07.20 |
申请人 |
CHOI SOO Y;WHITE JOHN M |
发明人 |
CHOI SOO Y.;WHITE JOHN M. |
分类号 |
B05D1/08;H01L21/02;C23C16/00;C23C16/34;C23C16/44;C23C16/455;C23C16/505;C23C16/509;C23F1/00;H01J37/32;H01L21/205 |
主分类号 |
B05D1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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