发明名称 SURFACE DEFECT INSPECTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a surface defect inspection apparatus enabling efficient creation of an inspection recipe for a test sample, to the inspection efficiency. SOLUTION: A substrate inspection apparatus includes an inspection section for imaging a pattern to extract a surface defect, and a control section 1B for controlling the operation of the inspection section based on control parameters. The apparatus further includes a control parameter calculation means 32 for calculating the control parameters from design data representing pattern formation conditions. The control parameters are organized into a recipe file by a recipe file organization section 36. The recipe file can be corrected by a recipe file correction section 35 based on light control results. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008014650(A) 申请公布日期 2008.01.24
申请号 JP20060183157 申请日期 2006.07.03
申请人 OLYMPUS CORP 发明人 TAKAHASHI TAKEHIRO
分类号 G01N21/956;G02F1/13;H01L21/66;H04N7/18 主分类号 G01N21/956
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