发明名称 SLURRY DISPENSING SYSTEM
摘要 A slurry dispensing system comprises a first supply station, a second supply station, a first loop, a second loop, a first valve and a second valve. The first loop is selectively connected to the first supply station and the second supply station. The second loop is also selectively connected to the first supply station and the second supply station. The first valve connects the first loop to points of use. The second valve connects the second loop to the points of use. When slurry is supplied to the first loop from the first slurry station, slurry is supplied to the second loop from the second slurry station. When the first valve is opened and the second valve is closed, slurry is supplied to the points of use from the first loop.
申请公布号 US2008017249(A1) 申请公布日期 2008.01.24
申请号 US20060557118 申请日期 2006.11.07
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 HSU MING-TZUNG;TAN PAUL;CHEN CHIANG-JEH;CHEN CHO-CHING;CHU HUI-MING
分类号 F16K51/00;F16K11/00 主分类号 F16K51/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利