发明名称 Nonvolatile Semiconductor Memory
摘要 A select gate transistor has a select gate electrode composed of a first-level conductive layer and a second-level conductive layer. The first-level conductive layer has contact areas. The second-level conductive layer has its portions removed that are located above the contact areas. Two adjacent select gate electrodes that are adjacent to each other in the column direction are arranged such that the contact areas of one select gate electrode are not opposed to the contact areas of the other select gate electrode. One select gate electrode has its first- and second-level conductive layers removed in their portions that are opposed to the contact areas of the other select gate electrode.
申请公布号 US2008019190(A1) 申请公布日期 2008.01.24
申请号 US20070829320 申请日期 2007.07.27
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 WATANABE HIROSHI;NAKAMURA HIROSHI;SHIMIZU KAZUHIRO;ARITOME SEIICHI;YAEGASHI TOSHITAKE;TAKEUCHI YUJI;IMAMIYA KENICHI;TAKEUCHI KEN;OODAIRA HIDEKO
分类号 G11C16/06;G11C16/04;H01L21/8247;H01L27/105;H01L27/115 主分类号 G11C16/06
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