发明名称 |
DEFLECTOR ARRAY, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
This invention discloses a deflector array in which a plurality of deflectors which deflect charged particle beams are arrayed on a substrate. Each deflector includes an opening formed on the substrate, and a pair of electrodes opposing each other through the opening. The length of the pair of electrodes in the longitudinal direction is not less than the distance between the centers of two deflectors equivalent to the plurality of deflectors, which are located nearest to each other.
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申请公布号 |
US2008017807(A1) |
申请公布日期 |
2008.01.24 |
申请号 |
US20070779498 |
申请日期 |
2007.07.18 |
申请人 |
CANON KABUSHIKI KAISHA;HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
NAGAE KENICHI;KANAMARU MASATOSHI |
分类号 |
G21K1/087 |
主分类号 |
G21K1/087 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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