发明名称 INTERLAYER INTERCONNECTION OF SEMICONDUCTOR DEVICE USING CARBON NANOTUBE, AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an interlayer interconnection of a semiconductor device using a carbon nanotube, and to provide its manufacturing method. SOLUTION: The interlayer interconnection of the semiconductor device using the carbon nanotube has a lower electrode, a catalyst layer for the carbon nanotube growth prepared so as to connect with the lower electrode electrically, a carbon nanotube bundle which comprises a plurality of carbon nanotubes growing up from the surface of the catalyst layer, in which the density in number of the upper end portion is higher than the density in number of the lower end portion, an interlayer insulating layer which encloses the carbon nanotube bundle, and an upper electrode arranged so as to connect with the upper end portion of the carbon nanotube bundle electrically on the interlayer insulating layer. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008016849(A) 申请公布日期 2008.01.24
申请号 JP20070175589 申请日期 2007.07.03
申请人 SAMSUNG SDI CO LTD 发明人 HAN IN-TAEK;KIM HA-JIN
分类号 H01L21/768;H01L23/522 主分类号 H01L21/768
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