| 摘要 |
<p>A method for verifying optical proximity correction is provided to improve speed and accuracy of model simulation by dividing a model into two parts, thereby preventing re-fabrication of a mask. An optical proximity correction is performed by using a variable threshold resist model, and then patterns are divided into a one-dimensional pattern and a second-dimensional pattern. The optical proximity correction on the one-dimensional pattern is verified by using a constant threshold resist model, and the optical proximity correction on the two-dimensional pattern is verified by using a variable resist model.</p> |
