THERMAL DECOMPOSITION-CONTROLLED METHACRYLIC RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a resin composition suitable for making films excellent in heat resistance and chemical resistance. SOLUTION: This methacrylate-based polymer (A) is obtained by copolymerizing monomers containing≥93 pts.wt. of an alkyl methacrylate with 0.01 to 30 wt.% of a specific UV light absorbent. Or, the methacrylate-based polymer (A) is characterized by containing acrylate-based cross-linked elastic particles (B) containing an alkyl acrylate as a main component. The methacrylate-based polymer (A) can be processed to obtain a film having the characteristics. COPYRIGHT: (C)2008,JPO&INPIT