| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microwave plasma processing apparatus and a gate valve therefor which can suppress leakage of microwaves outside when igniting plasma or the like without increasing particles, and consequently can reduce the possibility of generating discharge or the like by leaked microwaves than before. <P>SOLUTION: The gate valve 26 is constituted in a rectangular shape adapted to the shape of an aperture 25 of a processing chamber 1, and has a plate-like valve element 26a having the dimension larger than that of the aperture 25. The valve element 26a has a hermetic sealing member 26d which is abutted on and pressed against an outer side of the processing chamber 1 to provide the hermetic seal. A microwave reflecting mechanism 26e formed in a groove shape is provided on an outer circumferential part of the hermetic sealing member 26d so as to surround the circumference of the hermetic sealing member 26d. <P>COPYRIGHT: (C)2008,JPO&INPIT |
