| 发明名称 |
Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 摘要 |
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
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| 申请公布号 |
US2008017319(A1) |
申请公布日期 |
2008.01.24 |
| 申请号 |
US20070825136 |
申请日期 |
2007.07.02 |
| 申请人 |
FEI COMPANY |
发明人 |
KELLER JOHN;SMITH NOEL;BOSWELL RODERICK;SCIPIONI LAWRENCE;CHARLES CHRISTINE;SUTHERLAND ORSON |
| 分类号 |
H01J27/02;C23C16/00;H01J37/08 |
主分类号 |
H01J27/02 |
| 代理机构 |
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| 主权项 |
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