SUBSTRATE SUPPORT WITH ADJUSTABLE LIFT AND ROTATION MOUNT
摘要
<p>A method and apparatus for positioning a substrate support within a processing chamber is provided. In one embodiment, an apparatus for positioning a substrate support includes a first portion configured to mount to a bottom of a processing chamber and second portion configured to support a substrate support. The first portion is releaseably coupled to the second portion. The second portion includes a lower housing coupled to a lower collar. The lower collar is laterally positionable relative to the first portion. The lower housing has a planar orientation that is adjustable relative to a planar orientation of the lower collar.</p>
申请公布号
WO2008011306(A2)
申请公布日期
2008.01.24
申请号
WO2007US73168
申请日期
2007.07.10
申请人
APPLIED MATERIALS, INC.;CAMPBELL, JEFFREY;BURROWS, BRIAN, H.