POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition capable of suppressing pattern collapse of a resist pattern of a narrow pitch and a resist pattern forming method.

SOLUTION: The positive resist composition comprises a resin component (A) having an acid-dissociable dissolution inhibiting group and alkali solubility increased by the action of an acid and an acid generator component (B) which generates an acid upon exposure to light, wherein the acid generator component (B) comprises an onium salt (B1) having an anionic moiety represented by the formula (I): R4-SO3-(wherein R4represents a 3C fluoroalkyl group) and at least one acid generator (B2) selected from the group consisting of an onium salt (B2-1) having an anionic moiety containing no fluorine atom and a nonionic acid generator (B2-2) containing no fluorine atom.

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