| 摘要 |
PROBLEM TO BE SOLVED: To measure and to correct with high accurately the geometric strain in an optional magnification, in a charged particle beam microscopic device. SOLUTION: A geometric strain in the first magnification is measured as an absolute strain, based on a standard sample having a periodic structure. A fine structure sample is photographed in the first magnification, with which the geometric strain is measured and in a second magnification with which the geometric strain is not measured. An expanded/contracted image, determined by expanding/contracting in an isotropic way the image in the first magnification up to the image in the second magnification is generated. Geometric strain in the second magnification is measured as relative strain, based on the expanded/contracted image. An absolute strain in the second magnification is determined, from the absolute strain in the first magnification and the relative strain in the second magnification. Thereafter, relative strain measurement is repeated, by replacing the second magnification with the first magnification, to thereby measure and correct the geometric strains at an arbitrary magnification. COPYRIGHT: (C)2008,JPO&INPIT
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